Company Filing History:
2 out of 8 
1 out of 2 Years Active: 2021-2024
Title: Innovations of Jianfen Jing in Chemical Mechanical Polishing
Introduction
Jianfen Jing is a notable inventor based in Shanghai, China. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 3 patents. His work focuses on developing advanced polishing slurries that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Jing's latest patents include innovative formulations for chemical mechanical polishing slurries. One of his notable inventions is a chemical mechanical polishing slurry that comprises silicon dioxide particles, a nitrogen-containing heterocyclic compound with carboxy groups, and an ethoxylated butoxylated alky alcohol. This slurry is designed for polishing silicon oxide, polysilicon, and silicon nitride, achieving a significantly higher polishing rate for silicon nitride compared to silicon oxide and polysilicon. Additionally, he has developed a chemical mechanical polishing solution that includes silica abrasive particles, a corrosion inhibitor, a complexing agent, an oxidizer, and polyacrylic acid anionic surfactants. This formulation effectively decreases the removal rate of tantalum while increasing the removal rate of copper, thereby reducing copper dishing and dielectric erosion after polishing.
Career Highlights
Jing has worked with prominent companies in the semiconductor industry, including Anji Microelectronics (Shanghai) Co., Ltd. and Anji Microelectronics Technology (Shanghai) Co., Ltd. His experience in these organizations has allowed him to refine his expertise in chemical mechanical polishing technologies.
Collaborations
Throughout his career, Jianfen Jing has collaborated with talented professionals, including Wenting Zhou and Ying Yao, who have contributed to his research and development efforts in the field.
Conclusion
Jianfen Jing's innovative work in chemical mechanical polishing has led to advancements that significantly improve semiconductor manufacturing processes. His contributions are vital to the ongoing evolution of this technology, showcasing his role as a key inventor in the industry.