Jian Pan

Title: Innovations of Jian Pan in Semiconductor Technology

Introduction

Jian Pan is a prominent inventor based in Shanghai, China, known for his significant contributions to the field of semiconductor technology. With a total of six patents to his name, he has made remarkable advancements that have influenced the industry.

Latest Patents

One of Jian Pan's latest patents is related to field-effect transistors. This invention includes the formation of a fin structure on a substrate, with a gate structure that covers portions of the top and sidewall surfaces of the fin structure. It also involves a first doped layer made of a first semiconductor material and a second doped layer made of a second semiconductor material, each with distinct doping properties. Another notable patent is for a semiconductor device and its fabrication method. This method encompasses the formation of multiple mask layers and patterned layers on an interlayer dielectric layer, along with the creation of contact vias to expose the source and drain regions.

Career Highlights

Jian Pan has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Jian Pan has collaborated with notable colleagues such as Yihua Shen and Yunchu Yu, contributing to various projects that have advanced semiconductor technology.

Conclusion

Jian Pan's work in semiconductor technology showcases his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of complex semiconductor processes and materials, making him a valuable contributor to the industry.