Hsinchu, Taiwan

Jian-Huei Lee

This inventor holds 4 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1997-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jian-Huei Lee. Retrieved from https://idiyas.com/inventor/jian-huei-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.4

ph-index = 3

Forward Citations = 478(Granted Patents)


Company Filing History:


Years Active: 1997-1999

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4 patents (USPTO):Explore Patents

Title: Innovations of Jian-Huei Lee in Semiconductor Technology

Introduction

Jian-Huei Lee is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the fabrication processes of integrated circuit devices, which are essential in modern electronics.

Latest Patents

One of Jian-Huei Lee's latest patents is a method for the elimination of alignment field gaps. This innovative approach in photomask reticle design greatly increases tolerance to adjacent exposure field alignment and stepper magnification errors. By eliminating gaps between adjacent exposure fields, his method ensures complete exposure of photoresist, thereby preventing the formation of non-exposed unwanted photoresist residues or stringers that can lead to defects in semiconductor manufacturing.

Another notable patent involves a method for masking conducting layers to abate charge damage during the fabrication of integrated circuits. This method allows for the formation of a patterned conductor layer from a blanket conductor layer through a plasma etch method. It effectively avoids plasma-induced electrical discharge damage to the integrated circuit structure beneath the blanket conductor layer. The process includes forming a substrate, an integrated circuit structure, and a blanket conductor layer, followed by the application of a patterned photoresist layer that limits damage during the etching process.

Career Highlights

Jian-Huei Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative methods have contributed to advancements in the manufacturing processes of integrated circuits, enhancing the reliability and efficiency of semiconductor devices.

Collaborations

Throughout his career, Jian-Huei Lee has collaborated with notable colleagues, including Ying-Tzu Yen and Ping-Hui Peng. These collaborations have fostered a productive environment for innovation and development in semiconductor technology.

Conclusion

Jian-Huei Lee's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the field. His methods not only improve manufacturing processes but also enhance the overall quality of integrated circuit devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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