The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1999
Filed:
Jun. 14, 1996
Applicant:
Inventors:
Jian-Huei Lee, Hsin-Chu, TW;
Dong-Hsu Cheng, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacting Company, Ltd., Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430394 ; 430-5 ; 430 30 ; 430312 ;
Abstract
A method of photomask reticle design provides for greatly increased tolerance to adjacent exposure field alignment and/or stepper magnification errors, thus eliminating gaps between adjacent exposure fields in the fabrication of semiconductor integrated circuit devices.The resulting insurance of complete exposure of photoresist eliminates the formation of non-exposed unwanted photoresist residues or stringers, which constitute defects in the manufacture of such devices.
Lee, Jian-Huei. (1999). Method for elimination of alignment field gap (U.S. Patent No. 5871889). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5871889
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile