Shanghai, China

Jiacheng Wen

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Jiacheng Wen in Super Flash Technology.

Introduction

Jiacheng Wen is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of super flash memory devices. His innovative approach has led to advancements that enhance the efficiency and performance of these devices.

Latest Patents

Jiacheng Wen holds a patent for a technology titled "Super flash and method for manufacturing same." This patent describes a cell structure of a super flash that includes a word line gate, a floating gate, a control gate, and an erase gate. The design features a first TiN layer on the side face of the control gate and a second polysilicon layer on top of the first TiN layer. The configuration allows for improved electrical contact and reduced erasing voltage through point discharge during the erasing process.

Career Highlights

Wen is currently employed at Shanghai Huali Microelectronics Corporation, where he continues to innovate in the field of microelectronics. His work has been instrumental in advancing the capabilities of flash memory technology, making it more efficient and reliable for various applications.

Collaborations

Jiacheng Wen collaborates with talented colleagues such as Zhi Tian and Feng Ji. Their combined expertise contributes to the innovative projects at Shanghai Huali Microelectronics Corporation.

Conclusion

Jiacheng Wen's contributions to super flash technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and ongoing work at Shanghai Huali Microelectronics Corporation highlight the importance of advancements in memory technology.

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