Location History:
- Taoyuan County, TW (2008)
- Taoyuan, TW (2001 - 2014)
Company Filing History:
6 out of 40,780 
1 out of 544 Years Active: 2001-2014
Title: The Innovative Mind of Ji-Yi Yang
Introduction
Ji-Yi Yang, a distinguished inventor located in Taoyuan, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of seven patents to his name, his inventions demonstrate a deep understanding of material science and engineering principles.
Latest Patents
One of his latest patents focuses on the "Method of forming SOI-like structure in a bulk semiconductor substrate by annealing a lower portion of a trench while protecting an upper portion of the trench." This innovative approach transforms bulk silicon into an SOI-like structure by annealing, using trenches to define device sites. The lower sections of these trenches are subjected to low-pressure annealing in a hydrogen atmosphere, resulting in expanded, spheroidal voids beneath the device sites. Additionally, he has developed a "High-K dielectric metal gate device structure" that features both NMOS and PMOS gate structures on a semiconductor substrate. The NMOS gate utilizes a high-k gate dielectric treated with a dopant impurity such as Lanthanum, while the PMOS gate structure is designed without this dopant and incorporates a work function tuning layer over the high-k dielectric.
Career Highlights
Ji-Yi Yang has worked with esteemed organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and the National Science Council. His insights and innovative ideas have significantly influenced the projects he has been part of, advancing technologies crucial to the semiconductor industry.
Collaborations
Throughout his career, Yang has collaborated with notable professionals like Chien-Hao Chen and Tze-Liang Lee. Their combined efforts have fostered advancements in semiconductor technology, exemplifying the power of teamwork in driving innovation.
Conclusion
Ji-Yi Yang's inventive spirit and dedication to advancing semiconductor technology through his patents have marked him as a key figure in the field. His contributions not only highlight his individual talent but also underscore the collaborative nature of innovation in technology.