Company Filing History:
Years Active: 2016-2019
Title: Innovations of Jhih-Ming Wang
Introduction
Jhih-Ming Wang is a notable inventor based in Yunlin County, Taiwan. He has made significant contributions to the field of electrical engineering, particularly in the development of innovative semiconductor devices and electric connectors. With a total of six patents to his name, Wang's work showcases his expertise and creativity in addressing complex technical challenges.
Latest Patents
One of Wang's latest patents is an electric connector that features a metal interconnect, a first vertical element, and a second vertical element. This design includes a plurality of horizontal elements, with the first vertical element connecting to the top surface of each horizontal element and the second vertical element connecting to the bottom surface. Notably, the second vertical element misaligns the first vertical element, ensuring that either the first vertical element or the horizontal element burns out before the second vertical element when a voltage is applied.
Another significant patent is a semiconductor device designed for electrostatic discharge (ESD) protection. This device includes a drain region, a first doped region, a second doped region, and a source region. The drain region is located in a substrate at one side of a gate and has a first conductivity type. The first doped region is situated in a second doped well at the opposite side of the gate and has a second conductivity type. The source region surrounds the first doped region from a top view, while the second doped region is positioned between the gate and the source region, with multiple contacts electrically connected to it.
Career Highlights
Jhih-Ming Wang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to further develop his innovative ideas and contribute to cutting-edge technology in the field.
Collaborations
Wang has collaborated with several talented individuals, including Tien-Hao Tang and Li-Cih Wang. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.
Conclusion
Jhih-Ming Wang's contributions to the field of electrical engineering and semiconductor technology are noteworthy. His innovative patents reflect his dedication to advancing technology and addressing industry challenges. Wang's work continues to influence the development of new solutions in the semiconductor sector.