The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Sep. 22, 2016
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Jhih-Ming Wang, Yunlin County, TW;

Li-Cih Wang, Taoyuan, TW;

Tien-Hao Tang, Hsinchu, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/00 (2006.01); H01L 27/02 (2006.01); H01L 29/06 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0266 (2013.01); H01L 27/0248 (2013.01); H01L 29/0649 (2013.01); H01L 29/42376 (2013.01); H01L 29/7835 (2013.01);
Abstract

An ESD protection semiconductor device includes a substrate, a first isolation structure formed in the substrate, a gate disposed on the substrate, a source region formed in the substrate a first side of the gate, a first doped region formed in the substrate at a second side of the gate opposite to the first side, and a drain region formed in the first doped region. The gate overlaps a portion of the first isolation structure. The drain region is spaced apart from the first isolation by a portion of the first doped region. The substrate includes a first conductivity type, the source region, and the first doped region and the drain region include a second conductivity type. And the second conductivity type is complementary to the first conductivity type.


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