Jesus Orsely Carrero

Title: Innovations of Jesus Orsely Carrero

Introduction

Jesus Orsely Carrero is an accomplished inventor based in Mountain View, CA. He has made significant contributions to the field of lithography and computational modeling. With a total of 3 patents to his name, Carrero's work has advanced the technology used in photomask data verification and lithography processes.

Latest Patents

Carrero's latest patents include a "System and method for calibrating a lithography model." This invention provides a method for calibrating a computational model of a lithography process by calculating a demerit function using an intensity measurement at a location of a wafer. The method also involves calibrating the lithography model or a mask-making model by determining values of parameters of the computational model using the calculated demerit function. Additionally, a second demerit function may be used, defined by the sum of squares of differences between a simulated and measured critical dimensions of a feature on the wafer.

Another notable patent is the "Method of verifying photomask data based on models of etch and lithography processes." This patent describes a process where a photomask dataset corresponding to a target pattern is verified by simulating a resist pattern that will be formed in a resist layer by a lithography process. It also includes simulating an etched pattern that will be etched in a layer by a plasma process, which involves calculating a flux of particles impacting a feature and determining whether the etched pattern substantially conforms to the target pattern.

Career Highlights

Carrero is currently employed at Cadence Design Systems, Inc., where he continues to innovate and contribute to advancements in design and verification technologies. His work has been instrumental in enhancing the accuracy and efficiency of lithography processes.

Collaborations

Throughout his career, Carrero has collaborated with talented individuals such as Abdurrahman Sezginer and Bayram Yenikaya. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Jesus Orsely Carrero is a notable inventor whose work in lithography and computational modeling has led to significant advancements in the field. His contributions continue to shape the future of photomask data verification and lithography processes.