The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Jul. 20, 2007
Bayram Yenikaya, Sunnyvale, CA (US);
Devendra Joshi, San Jose, CA (US);
Paul A. Fornari, San Jose, CA (US);
Jesus O. Carrero, Mountain View, CA (US);
Abdurrahman Sezginer, Monte Sereno, CA (US);
Bayram Yenikaya, Sunnyvale, CA (US);
Devendra Joshi, San Jose, CA (US);
Paul A. Fornari, San Jose, CA (US);
Jesus O. Carrero, Mountain View, CA (US);
Abdurrahman Sezginer, Monte Sereno, CA (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
A photomask dataset corresponding to a target-pattern is verified by simulating a resist-pattern that will be formed in a resist layer by a lithography process, simulating an etched-pattern that will be etched in a layer by a plasma process wherein said simulation comprises calculating a flux of particles impacting a feature, and determining whether the etched-pattern substantially conforms to the target-pattern.