The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Oct. 02, 2006
Franz X. Zach, Los Gatos, CA (US);
Jesus Carrero, San Jose, CA (US);
Bayram Yenikaya, Sunnyvale, CA (US);
Gokhan Percin, Los Gatos, CA (US);
Xuelong Cao, Fremont, CA (US);
Abdurrahman Sezginer, Los Gatos, CA (US);
Franz X. Zach, Los Gatos, CA (US);
Jesus Carrero, San Jose, CA (US);
Bayram Yenikaya, Sunnyvale, CA (US);
Gokhan Percin, Los Gatos, CA (US);
Xuelong Cao, Fremont, CA (US);
Abdurrahman Sezginer, Los Gatos, CA (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.