Jess Köhler

Title: Jess Köhler: Innovator in Projection Exposure Systems

Introduction

Jess Köhler is a notable inventor based in Oberkochen, Germany. He has made significant contributions to the field of microlithography, particularly through his innovative projection exposure systems. With a total of 4 patents to his name, Köhler's work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Köhler's latest patents include a projection exposure system designed to generate an image of an object in an image plane. This system utilizes a light source that emits projection light, along with illumination optics and projection optics to achieve its purpose. A key feature of this invention is an optical element that modifies the angular illumination distribution of the projection light, allowing for flexible adjustments in symmetry. Another notable patent is an illumination system with reduced energy loading, which incorporates a rod integrator and an objective for imaging an object field. This system is designed to optimize ray heights and improve efficiency in imaging.

Career Highlights

Throughout his career, Jess Köhler has worked with prominent companies such as Carl Zeiss Stiftung and Carl Zeiss Semiconductor Manufacturing Technologies AG. His experience in these organizations has allowed him to refine his expertise in optical systems and semiconductor technologies.

Collaborations

Köhler has collaborated with talented individuals in his field, including Johannes Wangler and Nils Dieckmann. These partnerships have contributed to the development of innovative solutions in projection exposure systems.

Conclusion

Jess Köhler's contributions to the field of microlithography and projection exposure systems highlight his role as a leading inventor. His patents reflect a commitment to advancing technology in semiconductor manufacturing.