The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Mar. 30, 2001
Applicant:
Inventors:
Johannes Wangler, Königsbronn, DE;
Jess Köhler, Oberkochen, DE;
Assignee:
Carl-Zeiss-Stiftung, Heidenheim-Brenz, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 ;
U.S. Cl.
CPC ...
G02B 3/00 ;
Abstract
A microlithographic projection exposure arrangement has an off-axis field and has a catoptric or catadioptric projection objective (P). In this arrangement, the illumination system (ILL) is made as small as possible in that a lateral offset (&Dgr;y) of the optical axes (OAI, OAP) is introduced relative to each other. A corrective element (AE) is arranged off-axis and functions to adapt the telecentry.
Wangler, Johannes. (2003). Microlithographic illuminating system and microlithographic projection exposure arrangement incorporating said system (U.S. Patent No. 6597511). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6597511
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile