The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Jun. 04, 2001
Johannes Wangler, Königsbronn, DE;
Jess Köhler, Oberkochen, DE;
Carl-Zeiss Stiftung, Oberkochen, DE;
Abstract
The invention relates to an illuminating system of a microlithographic projection exposure arrangement having a light source ( ), a first objective ( ), a fly-eye-integrator ( ), a diaphragm plane ( ), a condenser optic ( ), and an image plane ( ) having a field to be illuminated. The fly-eye-integrator ( ) includes at least a first one-dimensional array ( ) of first cylinder lenses having first cylinder axes and a second one-dimensional array ( ) of second cylinder lenses having second cylinder axes. The second cylinder axes are aligned perpendicularly to the first cylinder axes. A third one-dimensional array ( ) of third cylinder lenses having third cylinder axes are mounted forward of the first array ( ) to increase divergence. The third cylinder axes are aligned parallelly to the first cylinder axes and a fourth one-dimensional array ( ) of fourth cylinder lenses having fourth cylinder axes is arranged forward of the second array ( ) for increasing divergence. The fourth cylinder axes are aligned parallel to the second cylinder axes.