Den Bosch, Netherlands

Jeroen-Frank Dekkers

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Asml Netherlands B.v.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeroen-Frank Dekkers. Retrieved from https://idiyas.com/inventor/jeroen-frank-dekkers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I focus on the sphere of innovations and inventions. Let's delve into the world of inventor Jeroen-Frank Dekkers, a man based in 's-Hertogenbosch, NL, with one patent to his name. His patent, titled "Patterning device," revolutionizes lithography apparatus by enhancing patterning device architecture and control arrangement. This system and method ensure effective and efficient beam radiation patterning.

**Title: The Brilliance of Jeroen-Frank Dekkers in Patterning Device Innovation**

Introduction:

Jeroen-Frank Dekkers, a talented inventor hailing from 's-Hertogenbosch, NL, has carved a niche for himself in the realm of technology with his groundbreaking patent.

Latest Patents:

Jeroen-Frank Dekkers' notable patent, the "Patterning device," showcases his expertise in revolutionizing lithography apparatus to achieve superior patterning outcomes.

Career Highlights:

Currently associated with ASML Netherlands B.V., Jeroen-Frank Dekkers has demonstrated a keen acumen for innovation and technological advancements within the company's dynamic environment.

Collaborations:

In his professional journey, Jeroen-Frank Dekkers has worked alongside accomplished individuals such as Bert Pieter Van Drieënhuizen and Antonius Johannes Maria Montagne, leveraging collaborative efforts to drive innovation.

Conclusion:

Jeroen-Frank Dekkers' contribution to the field of technology, particularly in the realm of patterning devices, exemplifies his pioneering spirit and commitment to advancing technological frontiers. His innovative patent stands as a testament to his ingenuity and dedication to enhancing lithography apparatus for future advancements in the industry.

If you seek more insights on inventors, patents, or innovations, feel free to explore our platform for a plethora of information on these fascinating subjects.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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