Asml Netherlands B.v.

Jeroen-Frank Dekkers

Bert Pieter Van Drieënhuizen

Paul Klatser

Antonius Johannes Maria Montagne

Marcus Hagting

A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.

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's-Hertogenbosch, Netherlands

Jeroen-Frank Dekkers