The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Jun. 26, 2006
Bert Pieter Van Drieënhuizen, Veldhoven, NL;
Antonius Johannes Maria Montagne, Delft, NL;
Jeroen-frank Dekkers, 's-Hertogenbosch, NL;
Paul Klatser, Markelo, NL;
Marcus Hagting, Enschede, NL;
Bert Pieter Van Drieënhuizen, Veldhoven, NL;
Antonius Johannes Maria Montagne, Delft, NL;
Jeroen-Frank Dekkers, 's-Hertogenbosch, NL;
Paul Klatser, Markelo, NL;
Marcus Hagting, Enschede, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.