Upper Saddle River, NJ, United States of America

Jeremy Rex Heaston

This inventor holds 1 USPTO granted patent. Top assignees: Asml Holding N.v., Asml Netherlands B.v.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeremy Rex Heaston. Retrieved from https://idiyas.com/inventor/jeremy-rex-heaston

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Jeremy Rex Heaston: A Pioneer in Innovation

Introduction:

Jeremy Rex Heaston, based in Upper Saddle River, NJ (US), is a relentless inventor dedicated to pushing the boundaries of technology. With a patent for "Shared compliance in a rapid exchange device for reticles, and reticle stage," he has made significant contributions to the world of inventions.

Latest Patents:

Heaston's notable patent involves a method to load a patterning device onto a reticle stage of a lithography system, showcasing his expertise in semiconductor manufacturing. The innovative approach of sharing compliance between the reticle stage and the Rapid Exchange Device (RED) demonstrates his commitment to advancing technology.

Career Highlights:

Throughout his career, Jeremy Rex Heaston has worked with leading companies such as ASML Holding NV and ASML Netherlands BV. His contributions to these organizations have been instrumental in driving innovation within the semiconductor industry.

Collaborations:

Heaston has collaborated with esteemed colleagues like Richard John Johnson and Frits Van Der Meulen. Together, they have leveraged their expertise to develop cutting-edge solutions that have set new standards in the field of technology.

Conclusion:

Jeremy Rex Heaston's dedication to innovation and his pioneering spirit make him a standout figure in the world of inventions. His work not only inspires future generations of inventors but also shapes the way we interact with technology on a global scale.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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