The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
Feb. 24, 2010
Richard John Johnson, Danbury, CT (US);
Frits Van Der Meulen, Eindhoven, NL;
Eric Bernard Westphal, Monroe, CT (US);
Jeremy Rex Heaston, Upper Saddle River, NJ (US);
Richard John Johnson, Danbury, CT (US);
Frits Van Der Meulen, Eindhoven, NL;
Eric Bernard Westphal, Monroe, CT (US);
Jeremy Rex Heaston, Upper Saddle River, NJ (US);
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Provided is a method to load a patterning device () onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device () onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device () are substantially in contact and coplanar.