San Jose, CA, United States of America

Jeremiah T Pender

USPTO Granted Patents = 13 

Average Co-Inventor Count = 5.6

ph-index = 7

Forward Citations = 727(Granted Patents)


Company Filing History:


Years Active: 2002-2022

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):

Title: **Innovator Profile: Jeremiah T. Pender**

Introduction

Jeremiah T. Pender is a prolific inventor based in San Jose, California, with a remarkable portfolio that includes 13 patents. His groundbreaking work primarily focuses on advancements in semiconductor manufacturing processes, specifically in the patterning of low-k dielectric films.

Latest Patents

Among his latest contributions, Pender has developed innovative methods that enhance semiconductor fabrication techniques. One notable patent is titled "Method of patterning a low-k dielectric film." This invention outlines a process for forming and patterning a mask layer above a low-k dielectric layer, followed by a nitrogen-free plasma modification of exposed portions. The approach includes a remote plasma process to effectively remove modified regions of the low-k dielectric layer, allowing for selective etching against unmodified sections.

Additionally, Pender's patent titled "Cyclic spacer etching process with improved profile control" addresses the complexities involved in substrate patterning. This patent presents a methodology where an inert plasma treatment is applied to spacer material before conducting an etching process. The iterative nature of the treatment and etching stages allows for precise control over the resulting spacer profile, which is crucial for achieving desired specifications in semiconductor devices.

Career Highlights

Jeremiah T. Pender has established himself at Applied Materials, Inc., a leading company in the field of semiconductor manufacturing equipment. His role involves significant contributions to research and development, particularly in enhancing processes that improve the efficiency and effectiveness of circuit patterning.

Collaborations

Throughout his career, Pender has collaborated with esteemed colleagues such as Srinivas D. Nemani and Qingjun Zhou. These partnerships have fostered a collaborative environment for innovation, allowing them to leverage their collective expertise to push the boundaries of semiconductor technology.

Conclusion

With a strong track record of patents and collaborations, Jeremiah T. Pender continues to impact the semiconductor industry profoundly. His innovative methodologies contribute to the ongoing evolution of manufacturing techniques, enhancing the performance and capabilities of modern electronic devices.

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