The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2002

Filed:

Jun. 30, 2000
Applicant:
Inventors:

Thomas J. Kropewnicki, Foster City, CA (US);

Jeremiah T. Pender, San Jose, CA (US);

Henry Fong, Daly City, CA (US);

Charles Peter Auglis, Plano, TX (US);

Raymond Hung, San Jose, CA (US);

Hongqing Shan, Cupertino, CA (US);

Assignee:

Applied Materials Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract

A substrate cleaning method comprises exposing a substrate to an energized process gas to remove residue 60 and resist material from the substrate In one version, the process gas comprises cleaning gas, such as an oxygen-containing gas, and an additive gas, such as NH . In one version, the process gas is introduced to remove residue and resist material from the substrate and to remove residue from surfaces in the process chamber


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