Jer-shen Maa

Title: Jer-shen Maa: Innovator in Integrated Circuit Technology

Introduction

Jer-shen Maa is a notable inventor based in Plainsboro Township, NJ (US). He has made significant contributions to the field of integrated circuit technology, holding a total of 6 patents. His work focuses on enhancing the performance and efficiency of electronic components.

Latest Patents

One of Jer-shen Maa's latest patents is for a low reflectance conductor in an integrated circuit. This innovation involves a layer of refractory metal that is applied over aluminum alloy or silicide conductors. The layer is treated in a plasma reactor to create a low reflective layer of refractory metal oxide on the surface. Another significant patent describes the formation of submicrometer lines. This process involves creating elongated structures with a linewidth significantly less than one micrometer. The structures are formed on a substrate and are coated with a second material that etches at a slower rate, allowing for precise etching and the creation of parallel lines.

Career Highlights

Throughout his career, Jer-shen Maa has worked with prominent companies such as RCA Inc. and General Electric Company. His experience in these organizations has contributed to his expertise in the field of integrated circuits and electronic components.

Collaborations

Jer-shen Maa has collaborated with notable individuals in his field, including Bernard Halon and Sheng M Huang. These collaborations have likely enriched his work and led to further advancements in technology.

Conclusion

Jer-shen Maa's contributions to integrated circuit technology through his patents and collaborations highlight his role as an influential inventor. His innovations continue to impact the field and pave the way for future advancements.