The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1987
Filed:
Mar. 28, 1986
Jer-shen Maa, Middlesex County, Plainsboro Township, NJ (US);
Sheng M Huang, Mercer County, Lawrenceville Township, NJ (US);
RCA Corporation, Princeton, NJ (US);
Abstract
The formation of elongated structures, such as lines, having a linewidth substantially less than one micrometer is described. An elongated structure of a first material having opposed sides, a rounded surface between the sides and a width typically of about one micrometer or greater is formed on a substrate. The sides of the structure are at least partially coated with a layer of a second material which will etch at a slower rate than the first material. The coating may completely cover the structure. The structure is anisotropically etched. Since the coating protects the sides of the structure, etching proceeds in the center to form two parallel lines, each significantly below one micrometer in width. In one embodiment, formation of the protective coating and etching of the structure are carried out simultaneously.