Jeong Yeong Park

Title: Innovations by Jeong Yeong Park

Introduction

Jeong Yeong Park is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of technology, particularly in the area of substrate treatment and mask cleaning methods. With a total of three patents to his name, Park's work reflects a commitment to advancing industrial processes.

Latest Patents

Among his latest patents is a "Mask cleaning apparatus and method for cleaning mask." This invention discloses a method for cleaning a photo mask, which includes a pre-treatment operation of wetting a chemical on the entire surface of the photo mask while it is stationary. The cleaning operation involves supplying the chemical to the pattern area of the photo mask while it is rotated. Another significant patent is the "Apparatus and method for treating substrate." This invention outlines a method for liquid-treating a substrate, which includes a first treatment liquid supplying operation and a wetting operation. The wetting operation ensures that the surface of the substrate does not dry while the treatment liquid is converted to a wetting liquid.

Career Highlights

Jeong Yeong Park has worked with prominent companies in the technology sector, including Semes Co., Ltd. and Samsung Corning Precision Materials Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative solutions for substrate and mask treatment.

Collaborations

Throughout his career, Park has collaborated with talented individuals such as Seong Soo Lee and Sung Bum Park. These collaborations have likely enhanced his research and development efforts, leading to successful innovations.

Conclusion

Jeong Yeong Park's contributions to technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.