The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2019
Filed:
Jun. 28, 2017
Semes Co., Ltd., Chungcheongnam-do, KR;
Young Ha Kim, Daejeon, KR;
Se Jeong Choi, Gyeongsangbuk-do, KR;
Kang Suk Lee, Chungcheongnam-do, KR;
Kiyoung Kwark, Gyeonggi-do, KR;
Jeoung Eun Park, Gyeonggi-do, KR;
Jeong Yeong Park, Chungcheongnam-do, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
Disclosed are an apparatus and a method for liquid-treating a substrate. The method for liquid-treating a substrate includes a first treatment liquid supplying operation of supplying a first treatment liquid to a treatment location of the substrate, and a wetting operation of, after the first treatment liquid supplying operation, supplying a wetting liquid onto the substrate, wherein the wetting operation includes a simultaneous supply operation of supplying the wetting liquid to the first location while the first treatment liquid is supplied, and wherein the first location is a location deviating from the treatment location. Accordingly, the surface of the substrate may be prevented from being dried while the treatment liquid is converted to a wetting liquid.