The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2021
Filed:
Oct. 12, 2018
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Seong Soo Lee, Gyeonggi-do, KR;
Jeong Yeong Park, Chungcheongnam-do, KR;
Sung Bum Park, Chungcheongnam-do, KR;
Byung Chul Kang, Chungcheongnam-do, KR;
Assignee:
SEMES CO. LTD., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/82 (2012.01); G03F 7/20 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 1/82 (2013.01); G03F 7/70908 (2013.01); G03F 7/70925 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/31133 (2013.01); H01L 21/67051 (2013.01);
Abstract
Disclosed is a method for cleaning a photo mask. The method includes a pre-treatment operation of wetting a chemical on an entire surface of the photo mask in a state in which the photo mask is stopped, and a cleaning operation of supplying the chemical to a pattern area of the photo mask in a state in which the photo mask is rotated.