Byung Chul Kang

Title: Byung Chul Kang: Innovator in Substrate Treatment Technologies

Introduction

Byung Chul Kang is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate treatment technologies, holding a total of 4 patents. His innovative approaches have led to advancements in cleaning methods and apparatuses that are essential in various industrial applications.

Latest Patents

One of his latest patents is a "Mask cleaning apparatus and method for cleaning mask." This invention discloses a method for cleaning a photo mask, which includes a pre-treatment operation of wetting a chemical on the entire surface of the photo mask while it is stationary, followed by a cleaning operation that supplies the chemical to the pattern area of the photo mask as it rotates. Another significant patent is the "Substrate treating apparatus and chemical recycling method." This invention provides a substrate treating apparatus that includes a cleaning chamber for removing foreign objects from a substrate and a recycling unit that recovers a mixed solution of chemicals used in the cleaning process.

Career Highlights

Byung Chul Kang is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate treatment. His work has been instrumental in enhancing the efficiency and effectiveness of cleaning processes in the semiconductor industry.

Collaborations

He has collaborated with notable colleagues, including Byung Man Kang and Donghyuk Jang, contributing to a dynamic team focused on advancing technology in their field.

Conclusion

Byung Chul Kang's contributions to substrate treatment technologies exemplify the impact of innovation in industrial applications. His patents reflect a commitment to improving cleaning methods and apparatuses, showcasing his role as a leading inventor in this specialized area.