Jeong-hee Chung

Title: The Innovations of Jeong-hee Chung: Advancements in Capacitor Technology

Introduction

Jeong-hee Chung is a prominent inventor based in Seoul, South Korea, known for his significant contributions to capacitor technology. With a total of eight patents to his name, Chung has been a pioneer in developing innovative methods that enhance the performance and reliability of capacitors used in integrated circuits.

Latest Patents

Chung's most recent patents showcase his expertise in advanced materials and processes. One of his notable inventions involves methods of forming metal-insulator-metal (MIM) capacitors with a separate metal-oxy-nitride seed dielectric layer. This innovation allows for a barrier layer that reduces reactions with the metal-nitride lower electrode during backend processing, crucial for integrated circuits. The introduction of nitrogen in the seed dielectric layer effectively minimizes issues commonly faced in conventional MIM capacitors.

Another key patent pertains to the atomic layer deposition process for forming thin films on substrates. This method involves sequentially introducing tantalum and titanium precursors, followed by oxygen, leading to the creation of a solid material that serves as an essential dielectric layer in capacitors and gate dielectric layers in transistors. Such advancements underline Chung’s commitment to elevating semiconductor technologies.

Career Highlights

Jeong-hee Chung has dedicated his career to exploring and developing cutting-edge technologies in the field of capacitors. He currently works at Samsung Electronics Co., Ltd., a global leader in technology and innovation. Throughout his career, Chung has garnered recognition for his pioneering work and has been involved in several groundbreaking research projects.

Collaborations

Collaboration plays a vital role in Chung's innovative endeavors. He has worked alongside talented colleagues, including In-Sung Park and Jae-Hyun Yeo. Together, they share insights and expertise that contribute to the advancement of capacitor technology, exemplifying the importance of teamwork in the research and development process.

Conclusion

Jeong-hee Chung's contributions to the field of capacitor technology are noteworthy and impactful. With eight patents attributed to his name and ongoing innovations at Samsung Electronics Co., Ltd., Chung continues to shape the future of electronic components. His work not only enhances technological capabilities but also sets a foundation for further advancements in the semiconductor industry.