Jeng Yang Pan

Title: Jeng Yang Pan: Innovator in Semiconductor Technology

Introduction

Jeng Yang Pan is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Jeng Yang Pan holds a patent titled "Method of high selectivity wet etching of salicides." This method enhances the formation of salicides, which are crucial for reducing sheet resistance and improving uniformity over semiconductor process wafers. The process involves providing a semiconductor wafer with exposed silicon areas, depositing a metal layer of cobalt or titanium, and performing thermal annealing to create metal silicide. The method further includes wet etching unsilicided areas using a solution of phosphoric acid, nitric acid, and a carboxylic acid, ensuring that salicides cover the silicon areas effectively.

Career Highlights

Jeng Yang Pan is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor manufacturing processes, contributing to the efficiency and performance of electronic devices.

Collaborations

Throughout his career, Jeng has collaborated with esteemed colleagues, including Chao-Jie Tsai and Chin-Nan Wu. These collaborations have fostered innovation and development in semiconductor technologies.

Conclusion

Jeng Yang Pan's contributions to semiconductor technology through his patent demonstrate his expertise and commitment to innovation. His work continues to influence the industry, paving the way for advancements in electronic manufacturing.