Jeng-Huei Yang

Title: Innovations of Jeng-Huei Yang in Semiconductor Processing

Introduction

Jeng-Huei Yang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor processing, holding a total of three patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of semiconductor substrate processing.

Latest Patents

Jeng-Huei Yang's latest patents include a "Method of Processing Semiconductor Substrate" and an "Apparatus of Processing Semiconductor Substrate." The method involves disposing a semiconductor substrate over a chuck with multiple holes, allowing a liquid layer to flow over the chuck's surface. This innovative approach ensures that the first surface of the semiconductor substrate is in contact with the liquid layer, facilitating improved processing. The apparatus patent describes a system that includes a chuck, a holder, a liquid supplying system, and a positive pressure unit, all designed to optimize the processing of semiconductor substrates.

Career Highlights

Jeng-Huei Yang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to develop and refine his innovative techniques in semiconductor processing.

Collaborations

Throughout his career, Jeng-Huei Yang has collaborated with talented individuals such as Wei-Chih Hsu and Kai-Lin Chuang. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a productive working environment.

Conclusion

Jeng-Huei Yang's contributions to semiconductor processing through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods and apparatuses continue to shape the future of semiconductor technology.