The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
May. 21, 2009
Applicants:
Mu-chieh Liu, Jhubei, TW;
Hsiao Wen Chung, Taipei, TW;
Jeng-huei Yang, Taichung, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A prescribed pattern is formed at a plurality of known locations on a semiconductor wafer. The plurality of known locations are incorporated into a defect map that includes a location of at least one defect detected by an in-line inspection of the wafer. The defect map including the plurality of known locations and the location of the at least one defect is transmitted to a scanning electron microscope (SEM). The SEM uses the known locations to calculate a defect offset for use in imaging the at least one defect in the SEM.