Jeng-Ho Wang

Title: Innovations by Jeng-Ho Wang

Introduction

Jeng-Ho Wang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of his latest patents is titled "Method of using aluminum layer as etching stop layer for patterning a platinum layer." This method involves several steps, including providing a substrate with a dielectric layer, forming an aluminum layer on the dielectric layer, and subsequently forming a platinum layer on the aluminum layer. The process includes a first etching to create a patterned platinum layer and a second etching to remove parts of the aluminum layer and dielectric layer.

Another notable patent is the "Etching method for manufacturing MEMS device." This method outlines a process that begins with a substrate featuring a base structure, a sacrificial structure, and at least one adhesion layer. The method includes surface grinding and two plasma etching processes to remove the sacrificial structure and adhesion layer, respectively.

Career Highlights

Jeng-Ho Wang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His expertise in etching methods and semiconductor fabrication has positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Jeng-Ho has collaborated with talented individuals such as Hsin-Yi Lu and Yu-Hsiang Chiu. These collaborations have further enhanced his innovative capabilities and contributed to the advancement of semiconductor technologies.

Conclusion

Jeng-Ho Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced electronic devices.