Jen Chieh Chang

Title: The Innovations of Jen Chieh Chang

Introduction

Jen Chieh Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of his latest patents is titled "Method for forming a gate structure through an amorphous silicon layer and applications thereof." This patent describes a fabrication method that involves providing a substrate layer and forming an amorphous silicon layer of a selected thickness at a reaction temperature between about 520°C and 560°C. Additionally, it includes the formation of a doped amorphous silicon layer in the upper portion of the amorphous silicon layer at the same temperature range. Another notable patent is "Wafer and the manufacturing and reclaiming methods thereof." This invention outlines a wafer that includes a semiconductor substrate and a protective layer on its surface. The reclaiming method described in this patent aims to prevent damage to the substrate during the reclaiming process, thereby increasing the reclaiming rate of the wafer.

Career Highlights

Jen Chieh Chang is currently employed at Mosel Vitelic Corporation, where he continues to innovate in the semiconductor industry. His expertise and dedication have made him a valuable asset to the company.

Collaborations

Throughout his career, Jen has collaborated with notable colleagues such as Yi Fu Chung and Pei-Feng Sun. These partnerships have contributed to the advancement of technology in their field.

Conclusion

Jen Chieh Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations.