Location History:
- Chang-fa, TW (1995)
- Hsinchu, TW (2003)
Company Filing History:
Years Active: 1995-2003
Title: Innovations of Jeffrey Wang
Introduction
Jeffrey Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit technology. With a total of 2 patents, his work focuses on enhancing the performance and reliability of electronic devices.
Latest Patents
One of his latest patents is the "Buried channel device structure." This invention provides an electrostatic discharge protection circuit that minimizes the effects of current flowing near the gate oxide layer. The design includes a p+ ion-doped region above a p-type substrate, which serves as a gate terminal. Additionally, first and second n+ ion-doped regions are formed on either side of the p+ gate terminal. An n-doped region is also created in the p-type substrate beneath the p+ gate terminal. This innovative structure can also be adapted for n-type configurations.
Another significant patent is the "Spin-on-glass planarization process with ion implantation." This method offers a new approach to planarizing integrated circuits. It involves depositing a silicon oxide layer over a metal layer, followed by a spin-on-glass layer that is cured and ion implanted. This process results in excellent planarity without the issues associated with poisoned via problems. It is particularly beneficial for submicron technologies, allowing for efficient processing without the need for an etch-back process.
Career Highlights
Jeffrey Wang is currently employed at United Microelectronics Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing integrated circuit design and manufacturing processes.
Collaborations
Some of his notable coworkers include Ming-Tsung Liu and Wen Yang Chen. Their collaborative efforts contribute to the ongoing success and innovation at United Microelectronics Corporation.
Conclusion
Jeffrey Wang's contributions to the field of integrated circuits through his patents and work at United Microelectronics Corporation highlight his role as a leading inventor in technology. His innovative approaches continue to shape the future of electronic devices.