Company Filing History:
2 out of 3,774 
1 out of 37,950 
Years Active: 1989-2000
Title: The Innovative Contributions of Jeffrey V Musser
Introduction
Jeffrey V Musser is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on advanced etching techniques that enhance the efficiency and yield of semiconductor manufacturing.
Latest Patents
Musser's latest patents include innovative methods for high-density plasma etching. One of his patents describes a process for etching through a selected portion of a metallization layer using a gas mixture of chlorine and nitrogen. This method allows for precise control over the etching process, particularly when working with aluminum metallization layers. Another patent outlines a method for forming conductive features by etching through a conductive layer above a semiconductor substrate. This technique employs different etch recipes to create a sloped etch foot, improving the overall yield of the conductive features.
Career Highlights
Throughout his career, Musser has worked with prominent companies in the semiconductor industry, including Lam Research Corporation and Micron Technology Incorporated. His experience in these organizations has allowed him to develop and refine his innovative techniques in plasma processing and etching.
Collaborations
Musser has collaborated with several professionals in his field, including Stephen F Powell and Robert Guerra. These partnerships have contributed to the advancement of semiconductor processing technologies.
Conclusion
Jeffrey V Musser's contributions to semiconductor processing through his innovative patents and career achievements highlight his importance in the field. His work continues to influence the efficiency and effectiveness of semiconductor manufacturing processes.