This inventor holds 5 USPTO granted patents. Top assignees: Synopsys, Inc., Synopsis Incorporated, Tektronix, Inc.. Active years: 1986-2011.
Company Filing History:
3 out of 2,595 
1 out of 13 
1 out of 2,758 
Years Active: 1986-2011
Title: The Innovative Contributions of Jeffrey P. Mayhew
Introduction
Jeffrey P. Mayhew is a notable inventor based in Portland, OR (US), recognized for his significant contributions to the field of micro lithography. With a total of 5 patents to his name, Mayhew has developed innovative methods that enhance the precision and efficiency of mask layouts in semiconductor manufacturing.
Latest Patents
One of Mayhew's latest patents is titled "Method and apparatus for determining mask layouts for a multiple patterning process." This invention provides a systematic approach to determining mask layouts by receiving a design intent, identifying critical edges, and assigning trenches to mask layouts to improve pattern fidelity. Another significant patent is the "Graph based phase shift lithography mapping method and apparatus." This method involves assigning phases to shifter polygons in a mask layer, ensuring that phase assignments in one aggregate do not affect others, thereby enhancing the overall efficiency of the lithography process.
Career Highlights
Throughout his career, Jeffrey Mayhew has worked with prominent companies such as Synopsys, Inc. and Tektronix, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in the field of micro lithography.
Collaborations
Mayhew has collaborated with esteemed colleagues, including Herbert S. Weiner and Martin Drapeau, further enriching his professional journey and expanding the impact of his innovations.
Conclusion
Jeffrey P. Mayhew's work exemplifies the spirit of innovation in the semiconductor industry. His patents and contributions continue to influence the development of advanced lithography techniques, showcasing his commitment to enhancing technology.