Company Filing History:
Years Active: 2008-2011
Title: Innovations by Jeffrey M Parker
Introduction
Jeffrey M Parker is an accomplished inventor based in Cedar Park, TX (US). He holds a total of 3 patents that showcase his expertise in process condition monitoring and module tuning. His innovative contributions have significantly impacted the field of substrate processing.
Latest Patents
One of Parker's latest patents is titled "Determining Process Condition in Substrate Processing Module." This invention involves a sensor network that collects time-series data from a process tool. The data is then supplied to an analysis system where pattern analysis techniques are employed to identify structures and monitor subsequent data based on analysis instructions or a composite model. The use of time-series data from multiple process runs helps form a composite model of a data structure, including variations. This comparison with the composite model provides an indication of tool health. Additionally, the sensor network may feature distributed memory for a more simplified configuration.
Another notable patent is "Process Module Tuning." This method characterizes a process module by gathering data using a process condition measuring device to measure process outputs while inputs are excited. The collected data is utilized to identify a dynamic process model, which is then used to determine process input settings that will yield desired outputs. For multi-zone process modules, the interactions between zones can also be modeled.
Career Highlights
Throughout his career, Jeffrey M Parker has worked with notable companies, including Kla Tencor Corporation. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in substrate processing technologies.
Collaborations
Parker has collaborated with several professionals in his field, including Forrest Gilbert Yetter, Jr. and Wayne Glenn Renken. These collaborations have further enriched his work and led to innovative solutions in process monitoring and tuning.
Conclusion
Jeffrey M Parker's contributions to the field of substrate processing through his patents and collaborations highlight his role as a significant innovator. His work continues to influence advancements in process condition monitoring and module tuning.
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