Boise, ID, United States of America

Jay Steven Brown

USPTO Granted Patents = 3 


Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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3 patents (USPTO):Explore Patents

Title: The Innovations of Jay Steven Brown

Introduction

Jay Steven Brown is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of electronic devices, particularly through his innovative patents. With a total of three patents to his name, Brown's work has had a considerable impact on the industry.

Latest Patents

One of his latest patents focuses on the plasma doping of gap fill materials. In various processes for forming electronic devices that utilize spin-on dielectric materials, the properties of these materials can be enhanced through plasma doping. This method allows for an increase in hardness and Young's modulus for the cured material. Additionally, other properties may also be enhanced. The plasma doping mechanism combines plasma ion implant and high-energy radiation associated with the ionized species. Furthermore, the physical properties of the spin-on dielectric materials can be modified along their length by selecting an appropriate implant energy and dopant dose, allowing for variations in selection with respect to length.

Career Highlights

Throughout his career, Jay Steven Brown has worked with prominent companies such as Micron Technology Incorporated and Intel Corporation. His experience in these leading organizations has contributed to his expertise and innovative capabilities in the field.

Collaborations

Some of his notable coworkers include Farrell Martin Good and Santanu Sarkar. Their collaboration has likely fostered an environment of creativity and innovation, further enhancing the development of new technologies.

Conclusion

Jay Steven Brown's contributions to the field of electronic devices through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and materials science.

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