This inventor holds 11 USPTO granted patents. Top assignees: Carl-Zeiss-Stiftung, Carl-Zeiss-Smt Ag, Carl-Zeiss-Stiftung Trading as Carl Zeiss. Active years: 2001-2004.
Company Filing History:
6 out of 702 
3 out of 461 
1 out of 11 Years Active: 2001-2004
Title: Innovator Jörg Schultz: Pioneering Advances in Illumination Systems
Introduction
Jörg Schultz, based in Aalen, Germany, is a prolific inventor with an impressive portfolio of 11 patents. His work focuses on the development of cutting-edge illumination systems that cater to the demands of modern lithography, especially in the area of extreme ultraviolet (EUV) applications.
Latest Patents
Among his latest innovations, Schultz has developed an illumination system with field mirrors for producing uniform scanning energy. This invention is crucial for scanning lithography using wavelengths of less than or equal to 193 nm. The system includes a light source and a uniquely shaped field lens group designed to distort the illuminated field within the plane of a reticle perpendicular to the scanning direction.
Another significant contribution is his control of the distribution of illumination in the exit pupil of an EUV illumination system. This complex system consists of a light source for emissions at wavelengths of less than or equal to 193 nm, a device for producing secondary light sources that include a mirror with raster elements, a diaphragm plane, and two optical elements that meticulously manage the light distribution parameters in the exit pupil. The versatility of these elements allows modifications through techniques like exchanging, displacing, and deforming to achieve the desired illumination effect.
Career Highlights
Throughout his esteemed career, Jörg Schultz has made notable contributions while working at renowned organizations such as Carl Zeiss Stiftung and Carl Zeiss SMT AG. His expertise and innovative mindset have solidified his reputation as a leader in the field of optical systems.
Collaborations
Schultz has collaborated with distinguished colleagues such as Johannes Wangler and Karl-Heinz Schuster. Their combined efforts reflect the collaborative spirit that drives advancements in technology and innovation within the field of lithography.
Conclusion
As a dedicated inventor, Jörg Schultz continues to push the boundaries of illumination systems, significantly impacting the lithography industry. His patents not only demonstrate his innovative prowess but also set the stage for future developments in high-precision optical technologies.