The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2004
Filed:
Jan. 30, 2002
Jörg Schultz, Aalen, DE;
Carl Zeiss SMT AG, , DE;
Abstract
There is provided an illumination system for a projection exposure system. The illumination system includes (a) a light source for the emission of wavelengths of ≦193 nm, (b) a device for producing secondary light sources, the device including a mirror having raster elements, (c) a diaphragm plane, (d) a first optical element for imaging the diaphragm plane in an exit pupil of the illumination system, (e) an object plane in which images of the raster elements are substantially in line and illuminate a predetermined field with an intensity distribution, and (f) a second optical element for producing a light distribution in the exit pupil. The light distribution is specified by a parameter selected from the group consisting of type and filling degree, and the parameter is modified by a technique selected from the group consisting of exchanging, displacing and deforming the second optical element.