The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2004
Filed:
Oct. 01, 2001
Jörg Schultz, Aalen, DE;
Alexander Sohmer, Oberkochen, DE;
Alexander Epple, Aalen, DE;
Johannes Wangler, Könnigsbronn, DE;
Christa Müller, Welzheim, DE;
Carl-Zeiss SMT AG, Oberkochen, DE;
Abstract
Partial objective for illumination of an image field in an illuminating device of a microlithographic projection exposure apparatus, arranged between a aperture plane and an image plane. The partial objective comprises a first lens group and a second lens group with a lens with a first aspheric lens surface. The second lens group has at least a first lens with negative refractive power and at least a second lens with positive refractive power. The maximum field height Y within the image field is at least 40 mm; the image-side numerical aperture is at least 0.15. The distribution of the chief ray angles PF over the field heights Y within the image field is given by a pupil function PF(Y ), which consists of a linear contribution c ·Y and a non-linear contribution PF (Y ), the non-linear contribution PF (Y ) being at least +15 mrad for the maximum positive field height Y .