This inventor holds 1 USPTO granted patent. Top assignee: Carl-Zeiss-Smt Ag. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Christa Müller: Innovator in Microlithographic Projection Exposure Apparatus
Introduction
Christa Müller is a prominent inventor based in Welzheim, Germany. She has made significant contributions to the field of microlithography, particularly in the development of illuminating systems. Her innovative work has led to the creation of a unique patent that enhances the efficiency of projection exposure apparatuses.
Latest Patents
Christa Müller holds a patent for a "Partial objective in an illuminating system." This invention focuses on a partial objective designed for the illumination of an image field in a microlithographic projection exposure apparatus. The patent describes a configuration that includes a first lens group and a second lens group, featuring a lens with a first aspheric lens surface. The second lens group incorporates at least one lens with negative refractive power and another with positive refractive power. Notably, the maximum field height Y within the image field is at least 40 mm, and the image-side numerical aperture is at least 0.15. The distribution of the chief ray angles PF over the field heights Y is defined by a pupil function PF(Y), which includes both linear and non-linear contributions.
Career Highlights
Christa Müller has established herself as a key figure in her field through her innovative work at Carl Zeiss SMT AG. Her expertise in optical systems and microlithography has positioned her as a valuable asset to the company. With her patent, she has contributed to advancements that are crucial for the development of high-precision imaging technologies.
Collaborations
Throughout her career, Christa has collaborated with notable colleagues, including Johannes Wangler and Alexander Sohmer. These partnerships have fostered an environment of innovation and have led to the successful development of cutting-edge technologies in the field.
Conclusion
Christa Müller is a remarkable inventor whose work in microlithographic projection exposure apparatuses has made a significant impact on the industry. Her patent reflects her dedication to advancing optical technologies, and her collaborations further highlight her role in fostering innovation.