Carl-zeiss-smt Ag

Christa M&uuml;ller

Alexander Epple

Johannes Wangler

J&ouml;rg Schultz

Alexander Sohmer

Partial objective for illumination of an image field in an illuminating device of a microlithographic projection exposure apparatus, arranged between a aperture plane and an image plane. The partial objective comprises a first lens group and a second lens group with a lens with a first aspheric lens surface. The second lens group has at least a first lens with negative refractive power and at least a second lens with positive refractive power. The maximum field height Y within the image field is at least 40 mm; the image-side numerical aperture is at least 0.15. The distribution of the chief ray angles PF over the field heights Y within the image field is given by a pupil function PF(Y ), which consists of a linear contribution c &middot;Y and a non-linear contribution PF (Y ), the non-linear contribution PF (Y ) being at least &plus;15 mrad for the maximum positive field height Y .

Growing community of inventors

Welzheim, Germany

Christa Müller

Growing community of inventors

Welzheim, Germany

Christa M&uuml;ller

Christa Müller