James O Kimball

This inventor holds 14 USPTO granted patents, primarily in Semiconductor Processing. Top assignees: Lsi Logic Corporation, Lsi Corporation. Active years: 1996-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James O Kimball. Retrieved from https://idiyas.com/inventor/james-o-kimball

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 14

% Patents Active = 78.6

Average Co-Inventor Count = 2.6

ph-index = 6

Forward Citations = 220(Granted Patents)

Company Filing History:

13 out of 3,715

Lsi Logic Corporation

Years Active: 1996-2010

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Areas of Expertise:

Thin Layer Deposition

Semiconductor Processing

Ionization Methods

Gate Dielectrics

Doped Drain Regions

Variable Thickness

Retrograde Well Structures

Low Energy Implantation

Group IV Semiconductors

Noble Gas Ions

Channeling Reduction

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7670645 - Method of treating metal and metal salts to enable thin layer deposition in semiconductor processing (2010-03-02),

2. 7323228 - Method of vaporizing and ionizing metals for use in semiconductor processing (2008-01-29),

3. 7084408 - Vaporization and ionization of metals for use in semiconductor processing (2006-08-01),

4. 6180470 - FETs having lightly doped drain regions that are shaped with counter and noncounter dorant elements (2001-01-30),

5. 6087229 - Composite semiconductor gate dielectrics (2000-07-11),

6. 6033998 - Method of forming variable thickness gate dielectrics (2000-03-07),

7. 5963801 - Method of forming retrograde well structures and punch-through barriers (1999-10-05),

8. 5904551 - Process for low energy implantation of semiconductor substrate using (1999-05-18),

9. 5858864 - Process for making group IV semiconductor substrate treated with one or (1999-01-12),

10. 5739580 - Oxide formed in semiconductor substrate by implantation of substrate (1998-04-14),

11. 5717238 - Substrate with controlled amount of noble gas ions to reduce channeling (1998-02-10),

12. 5707888 - Oxide formed in semiconductor substrate by implantation of substrate (1998-01-13),

13. 5654210 - Process for making group IV semiconductor substrate treated with one or (1997-08-05),

14. 5585286 - Implantation of a semiconductor substrate with controlled amount of (1996-12-17),

Title: Innovations of James O Kimball in Semiconductor Processing

Introduction

James O Kimball is a notable inventor based in San Jose, CA, with a significant contribution to the field of semiconductor processing. He holds 14 patents that showcase his expertise and innovative approaches in this area. His work has been instrumental in advancing techniques for vaporizing and handling metallic elements, which are crucial for modern semiconductor applications.

Latest Patents

Among his latest patents, Kimball has developed a method of treating metal and metal salts to enable thin layer deposition in semiconductor processing. This technique involves vaporizing a metallic element or metallic element salt with a heated inert carrier gas for further processing. The vaporized metallic element or salt is transported by an inert carrier gas, which is heated to the same temperature as the vaporizing temperature, to a heated processing chamber. The metal or salt vapor can be ionized and implanted or deposited on substrates. Additionally, he has patented an apparatus for accomplishing these techniques, which includes carrier gas heating chambers and heated processing chambers.

Another significant patent by Kimball is the method of vaporizing and ionizing metals for use in semiconductor processing. This method also utilizes a heated inert carrier gas to transport the vaporized metallic element or salt to a processing chamber, ensuring efficient handling and application of the materials involved.

Career Highlights

Throughout his career, Kimball has worked with prominent companies such as LSI Logic Corporation and LSI Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Kimball has collaborated with notable professionals in the field, including Sheldon Aronowitz and David Chan. These partnerships have further enriched his work and led to innovative solutions in semiconductor processing.

Conclusion

James O Kimball's contributions to semiconductor processing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced technologies in this critical field.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]