Company Filing History:
Years Active: 2016-2019
Title: James Nelson Stainton: Innovator in 3D Microscopy
Introduction
James Nelson Stainton is an accomplished inventor based in San Jose, California, with a notable contribution to the field of microscopy. He holds two patents that reflect his expertise and innovative thinking, specifically in the measurement of patterned substrates. His work has significantly advanced the capabilities of imaging technologies.
Latest Patents
Stainton's latest invention is a three-dimensional (3D) microscope designed for measuring patterned substrates. This innovative microscope integrates various components, including an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The unique feature of this invention is its ability to automatically adjust the objective lens focus at multiple Z steps. The optical sensor is adept at acquiring images at each of these Z levels. Furthermore, the processor manages the illumination and focusing components, allowing it to capture images both with and without patterns under different conditions.
Career Highlights
Throughout his career, James Nelson Stainton has made significant strides in the field of microscopy. He has worked with industry-leading companies such as Zeta Instruments, Inc. and KLA-Tencor Corporation, where he honed his skills and expertise in optical measurement technologies. His involvement in these companies has allowed him to contribute to the advancement of innovative measurement solutions.
Collaborations
Stainton has collaborated with esteemed professionals in his field, including Zhen Hou and James Jianguo Xu. These collaborations have fostered a productive environment for innovation, leading to the development of advanced technologies in microscopy and measurement systems.
Conclusion
James Nelson Stainton's contributions to the field of 3D microscopy exemplify his innovative spirit and commitment to advancing scientific understanding through technology. His patents reflect a deep understanding of both practical application and theoretical framework, paving the way for future advancements in the imaging of patterned substrates.
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