James M Lewis

Title: The Innovative Contributions of James M. Lewis

Introduction

James M. Lewis is a notable inventor based in Aurora, Ohio, recognized for his significant contributions to the field of photoresist compositions. With a total of six patents to his name, Lewis has made strides in developing materials that enhance the fabrication of micro-electronic devices. His work has been instrumental in advancing technologies that rely on precision imaging and processing.

Latest Patents

Among his latest patents, Lewis has developed a plasma developable photoresist composition with a polyvinyl formal binder. This photosensitive composition is particularly useful as a photoresist that can be processed entirely through dry techniques, especially using oxygen plasma. The composition includes an N-vinylmonomer and an organic hydrogen compound, which significantly enhances its utility in micro-electronic device fabrication. Another notable patent is a photosensitive image forming composition that contains at least one substituted bis-diaryl vinylidene compound and/or at least one substituted bis-diaryl imine compound along with tetraiodoethylene. This composition is designed to be applied in a dried photosensitive layer with a thickness not exceeding three microns, allowing for high precision in information readout by focused laser beams.

Career Highlights

Throughout his career, James M. Lewis has worked with Horizons Incorporated, a division of Horizons Research Incorporated, and Horizons Research Incorporated. His experience in these organizations has allowed him to refine his expertise in the development of innovative materials and processes.

Collaborations

Lewis has collaborated with notable individuals in his field, including Raymond Willis Newyear and Eugene F. McInerney. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

James M. Lewis stands out as a prominent inventor whose work in photoresist compositions has significantly impacted the micro-electronic industry. His innovative patents and collaborations reflect his dedication to advancing technology and improving manufacturing processes.