The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1977
Filed:
Aug. 15, 1975
Applicant:
Inventors:
Raymond W Newyear, Willoughby, OH (US);
James M Lewis, Aurora, OH (US);
Assignee:
Horizons Incorporated, a division of Horizons Research Incorporated, Cleveland, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
96 36 ; 96 67 ; 96 8 / ; 9611 / ; 96 9 / ;
Abstract
A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carbazole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.
Newyear, Raymond. (1977). Negative working photoresist material comprising a n-vinyl monomer, an (U.S. Patent No. 4021242). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4021242
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile