The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 1981
Filed:
Feb. 25, 1980
Applicant:
Inventors:
James M Lewis, Aurora, OH (US);
Eugene F McInerney, Chagrin Falls, OH (US);
Assignee:
Horizons Research Incorporated, Cleveland, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430283 ; 156643 ; 430281 ; 430325 ; 430328 ; 430434 ; 430905 ; 430909 ; 430913 ; 430925 ;
Abstract
A photosensitive composition useful as a photoresist which may be completely processed by dry techniques, especially by means of an oxygen plasma. The composition includes an N-vinylmonomer and an organic hydrogen compound in a binder which contributes significantly to the utility of the composition in the fabrication of micro-electronic devices.
Lewis, James. (1981). Plasma developable photoresist composition with polyvinyl formal binder (U.S. Patent No. 4278753). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4278753
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile