The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1976
Filed:
Oct. 03, 1973
Applicant:
Inventors:
James M Lewis, Aurora, OH (US);
Raymond W Newyear, Willoughby, OH (US);
Assignee:
Horizons Incorporated, a division of Horizons Research Incorporated, Cleveland, OH (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
96 36 ; 96 362 ; 96 4 / ; 156-8 ; 156 13 ; 156 15 ;
Abstract
Photoresists are developed and the supporting substrate is etched simultaneously therewith by bringing the resist (after exposure) into physical contact with a fluid containing a developer for the resist and an etchant for the supporting substrate.
Lewis, James. (1976). Process for simultaneous development and etch of photoresist and (U.S. Patent No. 3944421). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/3944421
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile