Company Filing History:
Years Active: 2007-2012
Title: Innovations of James Edward Vasek
Introduction
James Edward Vasek is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of integrated circuit design and photoresist technology. With a total of 5 patents to his name, Vasek's work has had a considerable impact on the semiconductor industry.
Latest Patents
Vasek's latest patents include a method and apparatus for designing an integrated circuit. This innovation involves adding a plurality of control points to an integrated circuit wafer design, where each control point possesses at least one attribute. The process culminates in the manufacturing of an integrated circuit wafer, followed by the identification of defects on the wafer. The control points are then adjusted to correspond with the identified defects. Another significant patent focuses on the treatment for the reduction of line edge roughness (LER) in a layer of photoresist. This method entails applying a layer of photoresist to a substrate, followed by patterning and annealing in an atmosphere containing gases such as hydrogen, nitrogen, and fluorine-containing materials.
Career Highlights
Throughout his career, James Edward Vasek has worked with prominent companies, including Freescale Semiconductor, Inc. and Koninklijke Philips Corporation N.V. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor field.
Collaborations
Vasek has collaborated with esteemed colleagues, including William D. Darlington and Jian Feng Chen. These partnerships have fostered innovation and have been instrumental in advancing their shared goals in technology development.
Conclusion
James Edward Vasek's contributions to integrated circuit design and photoresist technology exemplify his innovative spirit and dedication to advancing the semiconductor industry. His patents and collaborations reflect a commitment to excellence and a drive to push the boundaries of technology.